Showing results: 91 - 105 of 189 items found.
-
Flyin Optronics Co., Ltd
Flyin Optronics' Micro-Optical WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
-
Flyin Optronics Co., Ltd
Flyin optronics' Micro-Optics WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
-
Bruker Corporation
Bruker Semiconductor develops, manufactures, markets, and supports metrology solutions for thin films, which are based on novel, rapid, non-contacting and non-destructive X-ray technology. With Bruker’s acquisition of Jordan Valley Semiconductors, a name synonymous with unparalleled worldwide customer service and support, 75% of the world's top 25 semiconductor manufacturers rely on Bruker metrology tools for front-end and back-end applications, including development of their next-generation thin films. Bruker commitment to innovation and technology leadership drives the continued release of new advancements in metrology, and has garnered numerous awards and industry recognition. In applications ranging from C-S thin films materials characterization to wafer substrate analysis and defect detection, Bruker’s systems provide simulation analysis and fit. HRXRD, XRR, WA-XRD, and XRDI measurement types are fully supported, enabling researchers, production engineers, and process developers unparalleled capabilities. Whether you are a semi and C-S fabricator, R&D center or academy, or an industry materials research facility, Bruker has a specifically designed solution for your metrology needs.
-
SEMOZON® AX8580 -
MKS Instruments
The SEMOZON® AX8580 Ozone Delivery System generates and delivers high flow, high concentration, ultra-clean ozone for advanced thin film applications. The SEMOZON AX8580 is specifically designed for use with an increasing number of semiconductor process applications such as ALD, CVD and TEOS/Ozone CVD.
-
NOVA® Series -
MKS Instruments
The NOVA ; RF Plasma Generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
-
Nova Measuring Instruments Inc.
Nova is a market leader for innovative thin film metrology and process control technologies. We develop highly sensitive in-line metrology solutions on high productivity platforms, thereby enabling critical metrology solutions to be closer to a semiconductor fab’s process and integration needs.Our technologies enable customers to accurately detect and quantify small variations in film composition and thickness, thereby influencing better device functionality, and improved manufacturing yield.
-
Angstrom Sun Technologies, Inc.
When you need processed thin film uniformity information, our SRM series mapping tool is for your consideration. SRM series allow you to map film thickness and refractive index up to 5 layers. No need to worry about complicated equipment since the SRM300 is easy to setup and operate. It uses Windows based software, so most people are already familiar with the look and feel of the operating system.
-
FilmTek 2000 PAR-SE -
Scientific Computing International
Our most advanced benchtop metrology solution, engineered to meet the needs of nearly any advanced thin film measurement application, from R&D to production. Combines spectroscopic ellipsometry and DUV multi-angle polarized reflectometry with a wide spectral range to deliver the highest accuracy, precision, and versatility in the industry. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
-
FilmTek 3000 PAR-SE -
Scientific Computing International
Engineered to meet the needs of any advanced thin film measurement application, excelling at material characterization on both transparent and non-transparent substrates. Combines spectroscopic ellipsometry, DUV multi-angle polarized reflectometry, and transmission measurement with a wide spectral range to meet the most challenging of measurement demands in both R&D and production. Patented parabolic mirror technology allows for a small spot size down to 50µm, ideal for direct measurement of product wafers and patterned films.
-
IR9901 and 9902 -
Smartec bv
The Smartec infrared sensor SMTIR9901 and SMTIR9902 are sophisticated full silicon infrared sensors and comprise of so called thermopiles. Thermopiles are based on the Seebeck effect, which is a long time standard for conventional thermocouples. The application of thin film technology allows the production of miniaturised and low cost sensor elements.
-
Pickering Interfaces Ltd.
Simulation of resistance based temperature sensors such as positive or negative temperature coefficient thermistors. Resistance Temperature Detectors (RTDs) can be wire-wound or thin film. Our RTD simulator modules provide a cost-effective method of simulating both PT100 and PT1000 RTD sensor types that require fine setting resolution.
-
NEX CG II -
Applied Rigaku Technologies, Inc
NEX CG II, a powerful second-generation energy dispersive X-ray fluorescence (EDXRF) spectrometer, delivers rapid qualitative and quantitative determination of major and minor atomic elements in a wide variety of sample types — from oils and liquids to solids, metals, polymers, powders, pastes, coatings, and thin films.
-
NC-600 -
NAPSON Corp.
*Non-stop and non-contact sheet resistance measuring of thin film on glass runs through on conveyer*1 to 10 number of probe by sizes of glass is attachable*Glass collision prevention function*Continuous test data report to the host computer
-
Angstrom Sun Technologies, Inc.
Angstrom Sun Technologies Inc offers optical measurement and inspection systems for semiconductor and related industries. Its core products include wafer measurement systems, spectroscopic ellipsometers, thin film reflectometers, and microspectrophotometers.TFProbe wafer measurement systems, TFProbe WM series, measure wafer thickness, warp, bow, flatness, step/bump height, trench depth. TFProbe WM systems are based on confocal optical method with advantages of non-contact, non-destructive, long working distance, fast data acquisition, full mapping functions. Particularly, with integration with our thin film measurement technique, a total solution for thickness measurement covers from a few angstroms to several millimeters. Another key feature is that all our tools are upgradable in future.
-
DWDM-1200 -
Hangzhou Huatai Optic Tech. Co., Ltd.
Huatai DWDM-1204, DWDM-1208 dense DWDM DWDM, which is based on mature thin film filtering technology, It has the feature of low insertion loss, high isolation and flexible channel configuration. It can bi-direction transmit 4 channel(1204) or 8 channel(1208) on one fiber up stream/down stream.